November 06, 2021

Concertus launch campaign for Condition Improvement Funding (CIF)

What is CIF Funding?

Condition Improvement Funding (CIF) offers academies and sixth form colleges the opportunity to apply for additional funding from the Education and Skills Funding Agency (ESFA) to assist with building improvements or expansions.


Who can apply?

  • Single Academy Trusts
  • Small Multi-Academy Trusts with less than 5 schools and 3,000 pupils across the schools within their Trust (MAT’s)
  • Academies
  • Sixth Form Colleges


Concertus have a proven track record in securing funding for our clients through the CIF application process. Our experienced multi-disciplinary team of professionals are best placed in ensuring you have the maximum chance of success with your prospective bid this year.

We also offer support to MAT’s with more than 5 schools and over 3,000 pupils across the schools within their Trust, where they are eligible for direct Government funding to maintain and improve their estate. Working alongside the Trust, we understand the current condition of the schools, support the development of annual maintenance programmes and design and manage the projects that are identified as the most critical to ensure the schools operate at full capacity.

We offer a free service in conducting a technical appraisal of your requirements and writing a comprehensive bid on your behalf.


What can we help with?

The Concertus team are on hand to help you realise the maximum amount of funding for projects such as:

  • Roof and window replacements
  • Boilers and heating system upgrades and replacements
  • Increasing site safeguarding
  • Asbestos removal
  • Fire safety
  • Classroom expansions
  • Kitchen upgrades
  • Sports facilities


Key date for your diary:

Deadline for all applicants to submit applications: 15th December 2021 at 12 noon.


What are the next steps?

If you would like further assistance in preparing a bid and would like to have an assessment of your requirements, please get in touch with us.